ellipsometer造句
例句与造句
- Mathcad applied to testing of the optical constants for thin films with ellipsometer
Mathcad在椭圆偏振仪测定薄膜光学常数中的应用 - The thickness , extinction and reflection coefficients of the plct ( x ) thin films with variant layers were measured by ellipsometer
运用椭圆偏振仪测定了不同层数的薄膜厚度、消光系数、折射率。 - The refractive index ( at 632 . 8nm ) of cbn thin film with 92 . 8 % cubic phase content is measured to be2 . 19 by ellipsometer
用椭偏仪测得，对于波长为632 . 8nm的光，立方相含量为92 . 8的氮化硼薄膜的折射率为2 . 19 。 - The microstructures of the c60 films were studied with scanning electric microscope ( sem ) ; and the optical constants ( including absorption spectrunu refractive index and dielectric function ) of c60 films were measured with the ellipsometer
常温和77k温度8衬底上c60膜的制备，以及这两种薄膜的表面结构及光学性质的比较研究。光学参数主要由椭偏仪测量。 - Sem was used to observe the surface and the cross section of the films . index of refractive was derived from the ellipsometer . raman spectroscopy and xps were used to analyze the structure and composition of the films
用sem分析了薄膜的断面形态，在椭偏仪上测得其折射率，并对薄膜进行了raman光谱、 xps分析，在没有极化的条件下进行了二阶非线性maker条纹检测。 - It's difficult to find ellipsometer in a sentence. 用ellipsometer造句挺难的
- Their structures and optical properties were compared and analyzed . 2 the silver films were prepared at the room temperature and 77k on glass substrates . the microstructures and optical properties of the ag films were studied with the xrd , sem and ellipsometer , respectively
常温和77k温度玻璃衬底上金属（ ag 、 cu ）薄膜的制备，以及常温和77k玻璃衬底上ag薄膜的表面结构及光学性质的比较研究。 - 3 . the low dielectric silicate films were prepared by using poss sol - gel from hydrolyzation and condensation of y - methyl acryloyloxy propyl - triethoxysilane as template , and characterized by afm , bet and ellipsometer . a film with dielectric constant as low as 2 . 7 was obtained
3 、利用- (甲基丙稀酰氧)丙基三甲氧基硅烷水解缩和得到的poss溶胶作为模板剂制备得到了低介电薄膜材料，讨论了旋膜转速对薄膜厚度的影响。 - At last , the designed hr phase retardance films are produced by use of the e - beam evaporation equipment , then the phase retardance and the reflection of it are measured by lambda 900 spectrophotometer and the type of m - 2000ui ellipsometer . and the error of hr phase retardance film is analyzed
在此膜系的基础上，通过对最外面几层薄膜厚度的优化设计，最终设计出了45入射、对632 . 8nm和1315nm双波长高反，并在1315nm处有180和90位相延迟的高反射膜系。 - In this work , the author gave full - scale introduction for nano - materials about its structure and specialty , the application in practice and the progress in our country at present etc ; introduced and discussed the preparation , the structure and character of several nano - films ; explained in details the theory of the ellipsometer which measures the optical constants of the materials
本文对纳米材料的定义、结构特征及应用和我国纳米材料发展的现状作了较全面的介绍；对薄膜的制备、结构、特征进行了介绍和讨论；还详细介绍了测量材料光学性质的仪器? ?椭圆光谱偏振仪的结构原理及数据的处理方法。 - The measure of ellipsometer shows : the refractive index value of c60 cluster films in gas atmosphere is smaller than that of vacuum c60 films ( our measurement result is 1 . 94 ) and refractive index value of c60 cluster films in ar is larger than that in n2 . both refractive index values are nearly the same in lower pressure ( about 1 . 46 ) , but decrease with increasing gas pressure
椭偏仪测量表明：气氛条件下制备的c60薄膜的折射率n比在真空条件下制备的c60薄膜的折射率( 1 . 94 )小；在低压强条件下，不同气氛中制备的样品的折射率也几乎相等；在一定的压强范围内，折射率随着压强的增大而减小。 - In this thesis we have expatiated on the methods of the c60 thin films preparation , and the process with vacuum evaporation . the effect , which was caused by different gas pressures and other element doped , on surface morphology , structure and optical properties of c60 films have been studied by using scanning electron microscopy ( sem ) , ultraviolet visible optical absorption spectroscopy ( uv / vis ) ( type : uv - 240 ) , ellipsometer and x - ray diffraction
本论文阐述了用真空蒸镀法制备c60薄膜的方法和过程，研究了在不同气氛下生长和掺杂对c60薄膜的表面形貌、结构和光吸收特性的影响；用xl30fge型扫描电镜对c60薄膜表面形貌进行观察；用uv - 240型紫外可见光双光束分光光度计进行紫外、可见光吸收测量；用椭偏仪对薄膜进行厚度和折射率测量；用x射线衍射对薄膜结构进行分析。 - Highly c - axis oriented zno thin films were also grown on si ( 001 ) substrate by the present technique . in electrometer resistance meter , ultraviolate - visable spectrophotometer , spectroscopic ellipsometer were used to measure the electrical and optical properties . the results for the electrical properties of the thin films are revealed that the doping of li and mg could increase the electrical resistivity of the films , the highest electrical resistivity value was 11 . 18x 107qcm , which can meet the demands of piezo - electrical devices
同时运用高阻仪、紫外可见光谱、棱镜耦合仪等对掺li和mg的氧化锌薄膜光电性能以及能带结构进行了研究，可以得出以下结论：合适量的掺li和mg有利于提高氧化锌薄膜的电阻率，其最大值可达11 . 18 10 ~ 7 cm ，完全满足氧化锌薄膜作为一种压电薄膜的应用。
