reticle造句
例句与造句
- The integration level lies on the width of reticle
集成度取决于微芯片上的刻线宽度。 - Act of moving a mask or reticle to match up alignment marks
对准,调整掩模和晶片之间的位置。 - Standard guide for calibrating reticles and light microscope magnifications
校准标度线和轻型显微镜放大的标准指南 - Reticle rotation error
标线旋转误差 - Test method for calibration verification of laser diffraction particle sizing instruments using photomask reticles
用光掩模原版校准检验激光绕射粒子定尺寸仪器的试验方法 - It's difficult to find reticle in a sentence. 用reticle造句挺难的
- Also , purists should appreciate that it ' s possible to play with the old - school fps view , with nothing on screen but the gun reticle
另外，还可以用第一人称方式进行，屏幕上只有枪械的瞄准十字线。 - When the width of reticle is less than 30nm , the semiconductor material achieves its physical limit , and it would be happen that quantum effect
刻线宽度小于30nm时,半导体材料达到它的物理极限,就会发生量子效应。 - This paper presents the basic construction and movement rules of the coordinator gyrorotor with reticle of archimedes spiral reticule pattern , also , it explains the principles and methods of dynamical balance to damp the vibration and forced nutation
阐述了具有阿基米德螺旋线图案的位标器的基本原理及其运动规律，并说明这种陀螺转子的振动与绕动的平衡原理与方法。 - The grating and reticle , which linewidth errors are less than 10 % nominal linewidth , are fabricated by ldw . for the first time metallic mesh film with area 200mm 200mm fabricated by using ldw photolithography and coating technology
本文完成了直角坐标激光直写光刻技术研究，开展了离焦激光直写光刻的工艺研究，制作了光栅和网格分划板，线宽误差控制在10 %以内。 - In these years , image measuring has been used in every walk of life gradually . this paper discusses the characteristic , the virtue and the application of digital image measuring . in this paper . after analyzing the practical situation and theory , it has confirmed the project that identify automatically the pointer and the reticle of the pressure gauge with technique of optic photographic system , image process and automatic identification
近年来，图像测量逐渐应用到各行各业。本文讨论了数字图像测量的特点、优点及应用范围，结合实际情况和理论分析，确定了利用光学摄像系统和图像处理、识别技术，自动识别压力表的指针和刻线的方案，解决了压力表示值的自动检定问题，研制了一套集计算机、图像处理和识别、自动控制和光学等技术于一体的压力表示值的自动检定系统。 - Before more advanced lithography tool is produced , in order to use current tools to manufacture vdsm ic , reticle correction methods such as perturbing the shape ( via optical proximity correction ( opc ) ) or the phase ( via phase - shifting masks ( psm ) ) of transmitting aperture in the reticle are proposed by the industry
在波长更小的光刻系统出现前，为了能利用现有设备解决集成电路的可制造性问题，工业界提出了对掩模作预失真(光学邻近校正)和在掩模上加相位转移模(移相掩模)等的掩模校正方法。
