Method for chemical analysis of zirconium ores - determination of zirconium hafnium content - xylenol orange photometric method 锆矿石化学分析方法二甲酚橙光度法测定锆
Standard test method for determining hafnium in zirconium and zirconium alloys using the d - c argon plasma spectrometer 使用氢等离子体光谱计测定锆和锆合金中铪的标准试验方法
- zirconium and hafnium oxides - determination of phosphorus content - ascorbic acid reduced molybdoantimonylphosphoric acid absorption photometric method 氧化锆,氧化铪中磷量的测定
Method for chemical analysis of zirconium ores - determination of zirconium and hafnium contents - x - ray fluorescence spectrometric method 锆矿石化学分析方法x射线荧光光谱法测定锆量和铪量
Standard test method for corrosion testing of products of zirconium , hafnium , and their alloys in water at 680 f 360 c or in steam at 750 f 400 c 在750 f蒸汽中或在680 f水中锆铪及其合金产品的腐蚀测试的标准试验方法
These problems boost the study of high - k materials as the alternatives of sio2 gate dielectrics . among all high - k gate dielectric materials , hafnium oxide ( hfo2 ) is being extensively investigated as one of the most promising candidate materials due to its superior thermal stability with poly - si , biggish constant and reasonable band alignment . our researches focus on hfo2 dielectrics 高k栅介质材料已经被广泛地研究来替代sio _ 2 ，以降低栅泄漏电流和改善可靠性，其中， hfo _ 2由于其较大的介电常数、较大的禁带宽度、与si的导带和价带较大的偏置、以及与si的高的热力学稳定性等特征，被认为是最有希望的替代sio _ 2的栅介质材料之一。
