Prepar1ng po1 ypropy1ene / montmori l lon 1 te nanocomposi tes ( pcn ) . ma1 ei c anhydride ( mah ) / styrene ( st ) was app1 ied to graft wi th pp and montfnori 1lo - nite was interca1ated by ppalg - - mah / st in the same t1me . effects of intercalat ion agent htab on the basal spaci ng ( d . , , . ) 首先考察了插层剂对蒙脱土片层间距的影响，小角x -衍射表明在插层剂十六烷基三甲基溴化铵( htab )的作用下，无机土片层间距最大可被撑至4 . 0nm ，并且d _ ( 001 )值与插层剂的浓度大小有密切的关系。
The phase structure of different cu - fe thin films were studied by using grazing incidence x - ray analysis ( gixa ) . the texture and residual stress of different cu - fe thin films were measured by scan of x - ray diffraction ( xrd ) and 2 scan with different . the thicknesses of different thin films were characterized by means of small angle x - ray scattering ( saxs ) technique . by using atomic force microscope ( afm ) measured surface roughness of thin films . the component of different thin film was characterized by energy disperse spectrum ( eds ) and x - ray fluorescence ( xrf ) . the magnetic properties of cu - fe thin films were measured by means of vibrating sample magnetometer ( vsm ) . in addition , the giant magnetoresistance ( gmr ) effects of different films were also measured . the original resistance of the film fabricated by a direction - current magnetron sputtering system is directly affected by bias voltage 利用掠入射x射线分析( gixa )技术对不同cu - fe薄膜的相结构进行了研究;利用xrd扫描及不同角度的2扫描对薄膜进行了结晶织构及残余应力分析;运用小角x射线散射( saxs )技术测量了薄膜的厚度;采用原子力显微镜( afm )观察了薄膜的表面形貌;运用能量损失谱( eds )及x射线荧光光谱( xrf )对薄膜进行了成分标定;使用振动样品磁强计测量了不同cu - fe过饱和固溶体薄膜的磁性能;最后利用自制的磁阻性能测试设备测量了真空磁场热处理前后不同薄膜的巨磁阻值。
