Method for chemical analysis of manganin and novokostant resistance alloy the sulphosalic acid photometric method for the determination of iron content 锰铜和新康铜电阻合金化学分析方法磺基水杨酸光度法测定铁量
Method for chemical analysis of manganin and novokostant resistance alloy the dimenthylglyoxime gravimetric method for the determination of nickel content 锰铜和新康铜电阻合金化学分析方法丁二酮肟重量法测定镍量
Method for chemical analysis of manganin and novokostant resistance alloy the molybdosilicate blue photometric method for the determination of silicon content 锰铜和新康铜电阻合金化学分析方法硅钼兰光度法测定硅量
Method for chemical analysis of manganin and novokostant resistance alloy the perchloric acid dehydration gravimetric method for the determination of silicon content 锰铜和新康铜电阻合金化学分析方法高氯酸脱水重量法测定硅量
Determination of total silica , iron , aluminium , calcium , magnesium , potassium , sodium , phosphorus , sulphur , manganese , copper and zinc in forest plant and forest floor 森林植物与森林枯枝落叶层全硅铁铝钙镁钾钠磷硫锰铜锌的测定
Method for chemical analysis of manganin and novokostant resistance alloy the edta titrimetric method for the determination of aluminum content after separation with ammonium benzoate 锰铜和新康铜电阻合金化学分析方法苯甲酸铵分离- edta滴定法测量铝量
The sensors had high sensitivity . their sensitivity was about twice of that of other thin film manganin gauges and was very close to that of foil gauges 传感器的灵敏度高，约为其他单位研制的薄膜锰铜计的1倍，而与现用的低gpa的箔式锰铜计的灵敏度相近。
Method for chemical analysis of manganin and novokostant resistance alloy the ammonium nitrate oxidation - ammonium ferrous sulfate titrimetric method for determination of manganese content 锰铜和新康铜电阻合金化学分析方法硝酸铵氧化-硫酸亚铁铵滴定法测定锰量
The wearing resistance , microstructure , worn surface morphology and hardness change in wearing end - face and non - wearing end - face of cr - mn - cu alloy white cast iron were tested and analyzed 摘要对铬锰铜合金白口铸铁的耐磨性、无磨损端面及磨损端面的微观组织、磨损形貌及硬度进行了试验和分析。
It was found that the thin films and target were of similar composition . the optimal deposition temperature was 150 - 200 and the tcr of thin films were strongly influenced by the target temperature 发现磁控溅射法可以沉积得到与靶材组分一致的锰铜薄膜，沉积的最佳温度为150 200 ’ c ，并且阴极靶的温度对薄膜tcr有很大的影响。
