ablates造句
例句与造句
- abstract : during the measurement of optical nonlinearities of sample in the thin film by z-scan technique, ablating makes a hole in the thin film if the incidental laser power is too high, that will produce the error to measurement results
文摘:用单光束扫描法研究薄膜材料的非线性光学性质时，如果入射样品的激光功率过大，将会烧蚀薄膜而产生孔洞，虽然其归一化透过率曲线类似于没有烧蚀的情况，但与样品的非线性光学性质无关，因而造成测量结果错误。 - the electronic temperature, intensities of all lines and continuous spectra gradually increased with the increment of laser energy, and they got to maximum at different laser energy . our results of copper and aluminum show that there are possibly different thresholds of laser energy to electronic temperature and intensities of emission spectra of laser ablated plasma . at the different environmental gas pressure, spatial emission intensity distribution is explained by the competition among " heat reservoir effect ", " confined effect " and " s hadow effect "
认为cu等离子体羽的发光机制是由电子与粒子的碰撞传能、电子与离子的复合形成的；随激光能量的增加，cu等离子体特征辐射(分立谱)、连续背景辐射(连续谱)、电子温度都出现最大值；结合对al的实验结果说明：激光烧蚀金属产生的等离子体，其特征辐射、连续辐射、电子温度可能都存在一定的能量阈值；背景气压对激光烧蚀等离子体谱线的影响，其机理可以认为是“热库效应”、“约束效应”及“阴影效应”相互竞争的综合结果。 - the experimental results show that dlc film could be deposited on silicon substrate rapidly and uniformly in a large area by means of ablated plasma jet generating on the target surface during hipib irradiation, the instantaneous deposition rate is as high as imm / s and the uniform deposition area covered 40-50 cm2
实验结果表明，利用hipib烧蚀等离子体在si基体上可以实现快速、大面积、均匀地沉积类金刚石薄膜，薄膜的瞬时沉积速率达到1mms，均匀薄膜的面积达到40?50cm~2。 - in the hipib film deposition, high purity graphite was employed as target . relations between process parameters and the microstructure, as well as different physical properties of diamond-like carbon ( dlc ) film deposited by hipib ablated plasma were studied by adjusting the distance between target and substrate, which affects the intensity and ion energy of hipib ablated plasma, and the temperature of substrate in the film deposition processes . the mechanism of film deposition by hipib ablated plasma was explored also
在薄膜沉积方面，利用高纯石墨作靶材，调整薄膜沉积过程中的靶基距(烧蚀等离子体密度、离子能量)和基片温度，研究实验工艺对hipib烧蚀等离子体方法制备的dlc薄膜的微观结构和宏观物理性能的影响，探讨了hipib烧蚀等离子体沉积dlc薄膜的成膜机理。 - in the hipib film deposition, high purity graphite was employed as target . relations between process parameters and the microstructure, as well as different physical properties of diamond-like carbon ( dlc ) film deposited by hipib ablated plasma were studied by adjusting the distance between target and substrate, which affects the intensity and ion energy of hipib ablated plasma, and the temperature of substrate in the film deposition processes . the mechanism of film deposition by hipib ablated plasma was explored also
在薄膜沉积方面，利用高纯石墨作靶材，调整薄膜沉积过程中的靶基距(烧蚀等离子体密度、离子能量)和基片温度，研究实验工艺对hipib烧蚀等离子体方法制备的dlc薄膜的微观结构和宏观物理性能的影响，探讨了hipib烧蚀等离子体沉积dlc薄膜的成膜机理。 - It's difficult to find ablates in a sentence. 用ablates造句挺难的
- in the hipib film deposition, high purity graphite was employed as target . relations between process parameters and the microstructure, as well as different physical properties of diamond-like carbon ( dlc ) film deposited by hipib ablated plasma were studied by adjusting the distance between target and substrate, which affects the intensity and ion energy of hipib ablated plasma, and the temperature of substrate in the film deposition processes . the mechanism of film deposition by hipib ablated plasma was explored also
在薄膜沉积方面，利用高纯石墨作靶材，调整薄膜沉积过程中的靶基距(烧蚀等离子体密度、离子能量)和基片温度，研究实验工艺对hipib烧蚀等离子体方法制备的dlc薄膜的微观结构和宏观物理性能的影响，探讨了hipib烧蚀等离子体沉积dlc薄膜的成膜机理。 - carbon nanotubes were separately synthesized by a new pulsed laser ablation ( pla ) for in-situ growth method and cvd support method in this paper . ft-ir, uv-vis, xfs, laman, tem, xrd, bet methods were used to characterize the sol, carbon nanotube and other products in the experiment . in the pla method, the sols containing carbon nanotubes were successively obtained by using 1064nm pulsed laser to ablate the interface of fe / c, or ni / c targets and ethanol under common temperature and pressure, and then carbon nanotubes were directly acquired by evaporating the ethanol
脉冲激光轰击原位生长法是在常温常压下使用1064nm波长的脉冲激光轰击目标靶与乙醇流动相的固液界面来连续制备含有碳纳米管的溶胶，进而除去乙醇相得到碳纳米管，其中目标靶为石墨与fe、ni等金属催化剂混合压制成的靶片；cvd基体法是使用自制的六方介孔mcm-41多孔材料为基体，负载fe催化剂活性组分，通过cvd法催化裂解c2h2来生长碳纳米管。
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