电子束曝光的英文
electron beam exposure
electron beam lithography
electronbeam exposure
例句与用法
更多例句： 上一页 - In this article we briefly introduce the e - beam lithography techniques , and we describe our experiences in the modification of an sem into an e - beam writer
以电子显微镜改装成的简易电子束曝光机在性能上虽比不上设计精良的专业化电子束曝光机，但在很多情况下可以符合研发工作的要求，可说是经济实用的方案。 - A whole scheme of a new kind of digital pattern generator of the e - beam lithography system is given , including system function , hardware and software design
本论文介绍了扫描电子束曝光机图形发生器的总体方案、系统设计、硬件实现和软件编程等，提出了一套完整的图形发生器硬件方案，并完成了图形发生器接口的设计。 - Although a simply constructed scanning - electron - microscope ( sem ) - based e - beam writer can not be on a par with the commercially available multi - million - dollar e - beam writers , it offers a cost - effective solution for the research and development laboratories
在新元件研发过程中，往往希望能在短时间内不需光罩就可以作成奈米结构，电子束曝光技术提供了一套很适合这目的的解决方案。 - This thesis work has researched the fabrication technics of photonic crystal defect waveguide with air - bridge structure and collecting waveguide ; suggested using uv - lithography and wet etching to fabricate traditional waveguide , after that , using eb - lithography and dry etching to fabricate photonic crystal holes , so can reduce the fabrication cost by a big range ; designed the moulding board , which can fabricate the air - bridge structure and is convenient for recognizing position in eb - lithography ; the structure consisted of traditional waveguides and etching grooves are fabricated on soi successfully , then an successful eb - lithography is realized on the structure , the defect waveguide collected with the traditional waveguide quite well ; used the etching grooves to do the sacrificial layer etching experiment , which grounded etching sacrificial layer by photonic crystal holes in next step
提出采用紫外光刻工艺制作传统波导结构之后，通过电子束曝光和干法刻蚀制作光子晶体小孔的工艺方案，大幅度减低了制作成本；设计出可形成空气桥结构、并且适用于电子束曝光位置识别的光刻模板，在soi材料上成功制作出带有空气桥刻蚀预留槽以及接续光波导的结构，在该结构上成功实现了光子晶体带隙波导的电子束曝光，带隙波导与接续光波导位置接续良好；最后利用预留槽进行了刻蚀牺牲层的实验，为下一步利用光子晶体小孔刻蚀牺牲层形成空气桥结构打下了基础。
百科释义
电子束曝光（electron beam lithography）指使用电子束在表面上制造图样的工艺，是光刻技术的延伸应用。
详细百科解释
