电子束曝光的英文

• electron beam exposure
• electron beam lithography
• electronbeam exposure

• "电子束"英文翻译    electron beam
• "曝光"英文翻译    exposure
• "电子束曝光机" 英文翻译 :    electron beam exposure apparatus; electron beam exposure equipment; electron exposure equipment
• "电子束曝光器" 英文翻译 :    electron beam exposure system
• "电子束曝光系统" 英文翻译 :    e-beam exposure system
• "离子束曝光" 英文翻译 :    ion beam exposure; ion exposure
• "光致抗蚀剂的电子束曝光" 英文翻译 :    electron-beam photo-resist exposure
• "可变电子束曝光装置" 英文翻译 :    variable shaped electron beam exposure system
• "电子束直接曝光" 英文翻译 :    electron beam recording
• "电子束" 英文翻译 :    electron beam; pencil; bunch of electrons; bundle of electrons; cathode beam; cathode-ray beam; cathode-ray pencil; electron bundle; electron rays; electronic beam
• "电子群, 电子束" 英文翻译 :    packet of electrons
• "电子束电子" 英文翻译 :    beam electrons
• "电子束压焊, 电子束焊" 英文翻译 :    electron beam bonding
• "电子曝光" 英文翻译 :    electronic exposure
• "电子曝光表" 英文翻译 :    electronic exposure meter
• "保持电子束" 英文翻译 :    holding beam
• "带状电子束" 英文翻译 :    stripe electron beam
• "单电子束" 英文翻译 :    single electronic beam
• "单电子束管" 英文翻译 :    single electron beam tube
• "单能电子束" 英文翻译 :    monoenergetic electron beam; single energy electron beam
• "单速电子束" 英文翻译 :    single velocity electron beam
• "电子束（电磁波）" 英文翻译 :    electric ray rags electrico ,has electrico
• "电子束摆动" 英文翻译 :    beam jitter
• "电子束泵浦" 英文翻译 :    electrton-beam pumping
• "电子束参放" 英文翻译 :    electron beam parametric amplifier

• General specification of electron beam exposure system
  电子束曝光机通用技术条件
• Variable shaped electron beam exposure system
  可变电子束曝光装置
• Electron - beam photo - resist exposure
  光致抗蚀剂的电子束曝光
• Electron beam exposure apparatus
  电子束曝光机
• This paper introduced the develop level of electron beam lithography in the world and the techniques used in pattern generators
  论文首先简要介绍了国内外电子束曝光技术的发展水平和图形发生器的工作原理。
• In this article we briefly introduce the e - beam lithography techniques , and we describe our experiences in the modification of an sem into an e - beam writer
  以电子显微镜改装成的简易电子束曝光机在性能上虽比不上设计精良的专业化电子束曝光机，但在很多情况下可以符合研发工作的要求，可说是经济实用的方案。
• A whole scheme of a new kind of digital pattern generator of the e - beam lithography system is given , including system function , hardware and software design
  本论文介绍了扫描电子束曝光机图形发生器的总体方案、系统设计、硬件实现和软件编程等，提出了一套完整的图形发生器硬件方案，并完成了图形发生器接口的设计。
• Although a simply constructed scanning - electron - microscope ( sem ) - based e - beam writer can not be on a par with the commercially available multi - million - dollar e - beam writers , it offers a cost - effective solution for the research and development laboratories
  在新元件研发过程中，往往希望能在短时间内不需光罩就可以作成奈米结构，电子束曝光技术提供了一套很适合这目的的解决方案。
• This thesis work has researched the fabrication technics of photonic crystal defect waveguide with air - bridge structure and collecting waveguide ; suggested using uv - lithography and wet etching to fabricate traditional waveguide , after that , using eb - lithography and dry etching to fabricate photonic crystal holes , so can reduce the fabrication cost by a big range ; designed the moulding board , which can fabricate the air - bridge structure and is convenient for recognizing position in eb - lithography ; the structure consisted of traditional waveguides and etching grooves are fabricated on soi successfully , then an successful eb - lithography is realized on the structure , the defect waveguide collected with the traditional waveguide quite well ; used the etching grooves to do the sacrificial layer etching experiment , which grounded etching sacrificial layer by photonic crystal holes in next step
  提出采用紫外光刻工艺制作传统波导结构之后，通过电子束曝光和干法刻蚀制作光子晶体小孔的工艺方案，大幅度减低了制作成本；设计出可形成空气桥结构、并且适用于电子束曝光位置识别的光刻模板，在soi材料上成功制作出带有空气桥刻蚀预留槽以及接续光波导的结构，在该结构上成功实现了光子晶体带隙波导的电子束曝光，带隙波导与接续光波导位置接续良好；最后利用预留槽进行了刻蚀牺牲层的实验，为下一步利用光子晶体小孔刻蚀牺牲层形成空气桥结构打下了基础。

• 电子束曝光的法语：Lithographie à faisceau d'électrons
• 电子束曝光的日语：電子線描画装置
• 电子束曝光的俄语：Электронная литография