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临界厚度的英文

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"临界厚度"怎么读用"临界厚度"造句

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  • critical thickness

例句与用法

  • Critical thickness analysis of base plate gushing in cylindrical foundation pit with confined water
    承压水作用下圆形基坑底板突涌的临界厚度计算公式
  • High strength and stiffness can be achieved only in polymer films thinner than a critical thickness . the relationship between the microstructure and mechanical behaviors of conducting ppy films was described based on sem techniques at the first time
    同时,这些导电高分子薄膜材料的力学性能受薄膜厚度的影响:在某一临界厚度内其力学性能非常优异,超过这一厚度力学性能有所下降。
  • Prior to the growth , the critical thickness , which plays a vital role in the formation process of qd , is numerically calculated in terms of the strain relaxation , and the growth is carried out under the guidance of the calculated results
    在stranski - krastanow ( s - k )模式下制备了zncdse量子点,在生长量子点之前,先数值计算了系统的临界厚度,然后在该临界厚度值的指导下进行了量子点的制备。
  • By reading papers on debris flow ' s triggering and confluence , we know that if we consider debris flow ' s triggering and confluence as a whole system , its whole process have many critical characteristic situation . such as , critical slope grade , critical thickness of earth source , critical precipitation , critical runoff and critical velocity of flow
    本文通过对泥石流产汇流研究现状的分析得知,泥石流的产汇流可作为一个系统来研究,泥石流产汇流过程具有一系列临界特征值,如:临界坡度、土源临界厚度、临界雨量、临界流量和临界流速。
  • The theoretical calculation and explanation of strain behavior during heteroepitaxy of oxides thin films : when the lattice mismatch is relative small ( for example , batio _ 3 / srtio _ 3 with a lattice mismatch of 2 . 18 % ) , the growth mode of thin films is layer - by - layer , and the critical thickness and strain relaxation can be calculated or estimated by matthews - blakeslee expressions ; when the lattice mismatch is large ( for example mgo / srtio _ 3 with lattice mismatch of 8 % ) , the strain relaxation process can be explained by theory of coherent strained islands
    氧化物薄膜异质外延应变行为的理论预测和解释。对于晶格失配较小的外延体系(如batio3 / srtio _ 3 2 . 18 % ) ,薄膜以层状方式进行生长,临界厚度和应变释放过程可以用经典的matthews - blakeslee公式进行预测;对于晶格失配较大的体系(如mgo / srtio _ 3 8 % ) ,薄膜以岛状方式进行生长,应变释放过程可以由弹性应变岛的理论体系进行解释。
  • When increasing the oxygen pressure , the rheed pattern changes to streaky one again . this rheed pattern transformation induced by the oxygen pressure is reversible . ex situ xps results indicate that the element ni of lno film deposited in the relatively low oxygen pressure with thickness below the critical value exists in the form as ni2 + , while as ni3 + in the relatively high oxygen pressure
    随着膜厚增加而超过约30nm的临界厚度时,越来越多的晶格氧会移动到了薄膜表面,此时所提供的氧将使得后续生长的lno膜层重新形成钙钛矿结构,并以层状方式外延生长。
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