光刻技术的英文

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"光刻技术"怎么读用"光刻技术"造句

英文翻译手机版

lithography
photetch
photoetching technique

"光刻"英文翻译 photoetching
"技术"英文翻译 technology; skill; technique ...
"光蚀，光刻技术" 英文翻译 : photetch
"射线光刻技术" 英文翻译 : xray lithographyy
"超紫外线光刻技术" 英文翻译 : extreme ultraviolet lithography
"非光学光刻技术" 英文翻译 : nonoptical lithographic techniques
"按比例缩小光刻技术" 英文翻译 : scaled down lithography
"射线光刻技术，x射线平印术" 英文翻译 : x-ray lithography x
"浅刻技术" 英文翻译 : line cutting
"蚀刻技术" 英文翻译 : etching technique
"双蚀刻技术" 英文翻译 : double etching technique
"线刻技术" 英文翻译 : line cutting technique
"冷冻蚀刻技术" 英文翻译 : freeze-ctching technique
"蚀刻技术公司" 英文翻译 : tech etch inc; tech-etch inc
"超紫外光蚀刻技术" 英文翻译 : extreme uitraviolet lithography
"超紫外线蚀刻技术" 英文翻译 : extreme ultraviolet lithography
"电子束蚀刻技术" 英文翻译 : electron-beam lithography
"冷冻深度蚀刻技术" 英文翻译 : quick freeze deep etching
"光刻" 英文翻译 : [物理学] photoetching◇光刻材料 photoetching material; 光刻工艺 photoetching technology; 光刻技术 photoetching technique; photetch
"超紫外光微影技术；超紫外光蚀刻技术" 英文翻译 : extreme uitraviolet lithography
"雕刻技巧" 英文翻译 : sculpture techniques
"光刻，光蚀" 英文翻译 : potoeching
"光刻法" 英文翻译 : photolithography photoetching method; photomasking; photoprocessing; photoresist process
"光刻机" 英文翻译 : lithography machine; photoetching machine
"光刻胶" 英文翻译 : optical resist; photosensitive resist

例句与用法

Lithography, as used in the manufacture of ics, is the process of transferring geometic shapes on a mask to the surface of a silicon wafer .
光刻技术应用到集成电路制造中，就是将掩模版的几何图形转移到硅片表面的工艺过程。
Analysis of nanometrology and atom photolithography
纳米计量与原子光刻技术分析
The prospect for the maskless lithography technology
无掩模光刻技术的前景
Recent progress in photolithography technology
光刻技术及其新进展
The paper also emphatically studies some main applications of interferometric lithographic technology
故本文还着重研究了干涉光刻技术的一些主要应用。
The research results show that iil can get the high resolution more effectively than conventional optical lithography ( ol )
研究结果表明，掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。
With the rapid progress in microfabrication technology in recent years , it is of practical significance to design and consider subwavelength optical elements
近年来，微加工技术和纳米光刻技术的快速发展，使得设计亚波长光学元件具有实际意义。
The structure and basic theory of the electrical control system of the precision workbench . it is applied in quasi - molecular laser photolithographic technology
本文论述了精密工作台电控系统的结构及工作原理，它主要应用于准分子激光光刻技术中。
In order to enable the potential capability of interferometric lithography technology being applied in much more fields , the further deeper research is necessary
本文涉及的研究仅仅是干涉光刻研究的起步，为使干涉光刻技术的潜在能力在众多的领域中得到实际应用，更进一步的深入研究是十分必要的。
Finally , ldw technology on spherical substrate is discussed . the problems in writing process are analyzed in detail and its solutions are given . some primary experimental results are provided
开展了球面激光直写光刻技术研究，分析了球面直写光刻工艺实验难点，提出了有效的解决办法，进行了初步的实验研究。