光阻的英文
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"光阻"怎么读用"光阻"造句
英文翻译手机版
- photoresistance
- "光"英文翻译 light; ray
- "阻"英文翻译 block; hinder; impede; obstr ...
- "光阻的" 英文翻译 : light-negative
- "光阻剂" 英文翻译 : duv; photoresist
- "光阻抗" 英文翻译 : light negative
- "光阻尼" 英文翻译 : optical damping
- "光阻器" 英文翻译 : photoresistor
- "电泳光阻" 英文翻译 : electro-deposition photoresist
- "电着光阻" 英文翻译 : electro - deposited photoresist; electro-deposition photoresist
- "干膜光阻剂" 英文翻译 : dfr
- "光阻材料" 英文翻译 : photoresist
- "光阻处理" 英文翻译 : photoresists negative
- "光阻干膜" 英文翻译 : dry film
- "光阻抗突变" 英文翻译 : optical impedance discontinuity
- "光阻摄像管" 英文翻译 : resistron
- "光阻摄象管" 英文翻译 : resistron
- "光阻蚀剂" 英文翻译 : photoresist
- "光阻稀释剂" 英文翻译 : photo-resist thinner
- "光阻系统" 英文翻译 : photoresist system; system photoresist; system, photoresist
- "孔径光阻" 英文翻译 : aperture stop
- "膜光阻剂" 英文翻译 : dry film
- "乾膜光阻" 英文翻译 : dryfilm photoresistt; photoresist, dry film
- "液态光阻" 英文翻译 : aqueous photoresist
- "用之光阻" 英文翻译 : po pattern
- "正型光阻剂" 英文翻译 : positive acting resist
例句与用法
- Positive acting resist
正型光阻剂 - Microlithography processes : study the interaction between photoresists and exposure light . application : microlithoghy
二)微显影制程:研究光阻与曝光光源的作用.应用:微显影 - Researchers have used the technique to write lines with widths of only a few nanometers in a layer of photoresist on a silicon substrate
研究人员曾使用这种技术,在矽基座上的光阻层画出宽度只有几奈米的线。 - The parts of the photoresist struck by the light can be selectively removed , exposing parts of the silicon wafer in a way that replicates the original pattern
光阻剂受光照射的部份可以选择性移除,因此在晶圆上露出原来图案复制的部份。 - The most prevalent procedure is to use photolithography or electron - beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer
最常用的步骤是用光蚀刻或电子束蚀刻法,在矽晶圆表面的光阻层上制作出图案。 - However a novel electrolyte that can be used for gold electroplating and is suitable for formation of patterns on wafers in the application of electronics has been developed
由于亚硫酸系之镀金溶液能被应用于电子业中,不与光阻剂反应而能成形于矽晶元上。 - Now , many kind of 3d microstructure fabrications were developed , in which microlithography was changing characteristics in local area of photoresister , which illuminated uv light
延伸传统精密加工方法之微加工系统方法,其中之微影加工技术是利用紫外线光线照在光阻产生变化,使得显影作用于光阻剂的局部?围。 - This fabrication ' s main factors were photoresister ' s reactive light wave length , uv wave length , focusing area and light intensity . this technique could easily fabricate 3d microstructures
立体微影加工之主要因素有光阻反应的波长、紫外线光波长、聚焦面积及光强度。目标为传统微机电加工难以达成之三维微结构加工。 - Rf plasma system 9200 is a barrel - type batch stripping system with optional high temperature capabilities for photoresist removal , nitride etch , and other cleaning applications in semiconductor and mems fabs
射频等离子体9200是桶式炉脱模体,拥有可控制的高温系统可去除光阻材料、氮化物蚀刻和半导体与微型机电系统等方面的清洗功能 - A beam of light ( typically ultraviolet light from a mercury arc lamp ) shines through the chromium mask , then passes through a lens that focuses the image onto a photosensitive coating of organic polymer ( called the photoresist ) on the surface of a silicon wafer
一束光(通常是汞弧灯发出的紫外光)先穿透铬光罩,然后通过透镜把影像聚焦在晶圆表面的有机高分子感光涂料(称为光阻剂) 。
其他语种
- 光阻的日语:フォトレジスト
相关词汇
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