快速热处理的英文

• fast cycle heat treatment
• processing, rapid thermal (rtp)
• rapid thermal processing (rtp)
• rtp

• "快速"英文翻译    fast; quick; high-speed; spe ...
• "热处理"英文翻译    heat treatment; heat treatin ...
• "迅速热处理" 英文翻译 :    rtp: rapid thermal process
• "快速热电偶" 英文翻译 :    fast thermocouple
• "快速热分析" 英文翻译 :    high speed thermal analysis
• "快速热水炉" 英文翻译 :    non-storage water heater
• "快速热丝" 英文翻译 :    quick heater
• "快速热退火" 英文翻译 :    rta
• "快速热氧化" 英文翻译 :    rto
• "热处理" 英文翻译 :    [冶金学] heat treatment; heat treating◇热处理保护涂料 heat treatment protective coating; 热处理车间 heat treatment department; 热处理钢 heat-treated steel; 热处理炉 heat treatment furnace; heat treating furnace; 热处理膜 [冶金学] heat-treating film; 热处理设备 heat-treating facility
• "快速热交换装置" 英文翻译 :    qhs quick hot swap
• "快速热欧姆转换" 英文翻译 :    fft(fast fourier transform
• "煤气快速热水器" 英文翻译 :    rapid gas water heater
• "标准热处理" 英文翻译 :    standard heat of formation
• "表面热处理" 英文翻译 :    hot surface treatment; surface heat treatment; thermolized; thermolizing
• "玻璃热处理" 英文翻译 :    heat treatment of glass
• "箔袋热处理" 英文翻译 :    foil heat treatment
• "箔片热处理" 英文翻译 :    foil heat treatment
• "不可热处理" 英文翻译 :    non-heat-treatable
• "沉淀热处理" 英文翻译 :    precipitation heat treatment
• "成品热处理" 英文翻译 :    heat treatment for finished product
• "初步热处理" 英文翻译 :    preliminary heat treatment
• "磁场热处理" 英文翻译 :    magnetic heat treatment
• "磁致热处理" 英文翻译 :    field annealing
• "摧化热处理" 英文翻译 :    catalytic thermal treatment

• Moreover , the mechanism for the dissolution of oxygen precipitates by rtp is discussed
  另外，计论了快速热处理消融氧沈淀的物理机制。
• Finally , the effect of rapid thermal process ( rtp ) on oxygen precipitation in hb is investigated in this paper
  最后文章还系统研究了快速热处理( rtp )对重掺硼硅单晶中氧沉淀的影响。
• The influence of rapid thermal process in different gases on the photoluminescence properties of porous silicon was discussed
  同时研究了在不同气氛下的快速热处理( rtp )对多孔硅发光特性的影响。
• Because of this , the behavior of impurities and defects in silicon during the rt p become a new research focus
  这一应用使硅中杂质和缺陷在快速热处理过程中的行为的研究成为目前硅材料研究的新热点。
• The effect of high temperature in rapid thermal process ( rtp ) on the dissolution of oxygen precipitate generated by two - step ( low - high ) annealing is investigated
  摘要通过对已经过两步（低高）退火的大直径直拉矽单晶片进行高温快速热处理，研究矽中氧沈淀被高温快速热处理消融的情况。
• It is verified that the high temperature in rtp can efficiently dissolve the existing oxygen precipitates , indicating that the annealing temperature other than time is the determinative factor for the dissolution of oxygen precipitates
  研究证实：高温快速热处理可以显著地消融氧沈淀，氧沈淀消融的决定性因素是热处理温度。
• By rapid thermal processing ( rtp ) , high active atoms are excited while decomposing the gel precursor film , and consequently , much more contents of crystalline phase are obtained even at relatively lower temperature
  通过快速热处理方法，在凝胶分解过程中得到的高活性离子直接形成晶相，可以在较低的温度下形成晶相及得到相应更多的晶体含量。
• Both hydrogen plasma and sinx thin film can effectively enhance the short circuit current density of mono and poly silicon solar cells , which cause the improvement of the absolute transfer efficiency about 0 . 5 % ~ 2 . 9 % . depositing sinx thin film followed by hydrogen plasma treatment will result in better passivation effect . the thickness of sinx thin film will decrease and the refractive index will increase after annealing
  经过薄膜后退火处理发现，氮化硅薄膜经热处理后厚度降低，折射率升高，但温度达到1000oc时折射率急剧降低；沉积氨化硅薄膜后400oc退火可以促进氢扩散，提高钝化效果；超过400oc后氢开始逸失，晶体硅材料中的少子寿命急剧下降； rtp （快速热处理）处理所导致氢的逸失比常规退火处理显著。
• Although the diffusion of nitrogen and oxygen in silicon has been intensely studied respectively , the mechanism on in - diffusion of nitrogen and oxygen into silicon during rt p is unavailable . this research will provide theoretic direction for rtp application to defects engineering
  尽管国内外对硅中氮、氧杂质的扩散行为进行了大量的研究，但他们在高温rtp处理过程中的内扩散行为在国内外的研究领域中至今仍是一个空白，这一研究将为快速热处理在硅材料缺陷工程中的应用提供理论指导。
• With the development of vlsi ( very large scale integration ) and ulsi ( ultra large scale integration ) , rtp ( rapid thermal process ) , which consumes less time and less energy than classical thermal treatments , have been widely employed in semiconductor manufacturing . however , the most importance is that rtp is applied for defects engineering of silicon material . it is generally believed the rtf leads to the injection of additional vacancies into silicon wafer , and then a so - called magic denuded zone ( mdz ) in the near - surface region of cz silicon wafer was formed by controlling the vacancy distribution
  随着大规模集成电路( vlsi )和超大规模集成电路的发展，节省时间、节省能量、容易控制的快速热退火工艺在半导体器件制造工艺中得到了广泛的应用，并且在硅材料的缺陷工程中发挥了特殊的作用，人们通过高温快速热处理在硅片中引入空位，并控制空位的分布，进而形成了具有较强内吸杂能力的洁净区。