投影物镜的英文

• projection objective

• "投影"英文翻译    projection; projective; shad ...
• "物镜"英文翻译    objective; objective lens; o ...
• "艾克塔投影物镜" 英文翻译 :    projection ektar lens
• "双胶合轮廓投影物镜" 英文翻译 :    doublet profile lens
• "摄影物镜" 英文翻译 :    photographic field lens; photographic objective
• "变形摄影物镜" 英文翻译 :    anamorphic camera lens
• "爱克塔摄影物镜" 英文翻译 :    ektar lens
• "航空探测摄影物镜" 英文翻译 :    aerial-reconnaissance lens
• "大相对孔径摄影物镜" 英文翻译 :    object lens of large relative aperture
• "特大开口率摄影物镜" 英文翻译 :    wide aperture photo objective
• "物镜" 英文翻译 :    [物理学] objective; objective lens; object glass
• "投影" 英文翻译 :    projection; projective; shadow 极投影 polar projection; 墨卡托地图投影 mercator map projection; 投影电视 projection television; screen size television; 投影电视接收机 projection television receiver; projection tv receiver; 投影画[图] projection; projection drawing; 投影机 projector; 投影几何 (学) projective geometry; descriptive geometry; 投影图 skiagraph; 投影图形 projection figure; 投影物镜 projection objective; 投影仪 projecting apparatus; projector
• "接物镜，物镜" 英文翻译 :    objective
• "对物镜" 英文翻译 :    object glass; objectglass
• "干物镜" 英文翻译 :    dry objective
• "接物镜" 英文翻译 :    objective lens; objective; object lens
• "浸物镜" 英文翻译 :    immersion objective
• "看物镜" 英文翻译 :    sight glass
• "双物镜" 英文翻译 :    doublet
• "物镜盖" 英文翻译 :    objective cap
• "物镜环" 英文翻译 :    object glass collar
• "物镜架" 英文翻译 :    objective carrier
• "物镜简" 英文翻译 :    lens cone
• "物镜孔" 英文翻译 :    objective aperture; objective window
• "物镜台" 英文翻译 :    objective table

• In initial result , line width of 0 . 75 u m was replicated on resist - coated wafer , and using more narrow mask imaging experiments are being carried out to find the imaging ability and the best focus position of the optics
  目前，利用更细线宽透射掩模的曝光复制实验正在进行中，以获得最小的复制线宽及schwarzschild微缩投影物镜的最佳焦面。
• The roughness of wyko and afm measuring are 0 . 73nm and 0 . 56nm in rms value respectively , in both primary and secondary mirrors , and will severity reduce the schwarzschlid optics throughput and the contrast of the image
  73urn ） sm ， wyko检测结果）波纹度和高频段的0 56urn （ ms ， afm捡测结果将严重影响schwarzschild微缩投影物镜的成像对比度和传输效率。
• The projection optics with aspherical mirror of sub - nanometer accuracy are required to get a resolution of less than 0 . 1 m m and wide exposure area simultaneously . the precision of polishing and testing for such ashperical surface is fairly high and it has not been achieved yet in our current state
  Euvl微缩投影物镜为了同时实现大的曝光视场和0 . 1 m以下的成像分辨率，微缩投影光学系统需采用面形精度达亚纳米量级的非球面，但我们现阶段的光学加工和检测技术距此要求尚有一定的差距。
• The primary and secondary mirrors of the schwarzschild optics were fabricated in our institute and measured using zygo mark iv interferometer . figure errors were observed in both primary and secondary mirror of 5nm ( rms ) . these magnitudes are very small at visible wavelength but sufficient to cause significant degradation in the wave - front quality of the schwarzschild optics in extreme ultraviolet ( euv ) wavelength
  利用zygomark干涉仪检测的schwarzschild微缩投影物镜主、次镜面形精度表明，对可见光工作波段已具有足够高的面形精度，均为5nm ( rms ) ，但在euv ( extremeultraviolet )波段，将给schwarzschild微缩投影物镜带来严重的波面误差。
• It might preferable , however , to use shperical mirror for the first step studies of euvl in a series investigation of system design , component fabrication , assembly technique and experimental process . along this thought , the author designed a schwarzschild optics using spherical mirrors with 10 : 1 reduction projection optics
  作为研究的第一步，出于进行euvl原理及系统设计、光学元件的制备、系统集成、掩模曝光实验等相关技术研究目的，采用球面schwarzschild微缩投影物镜是比较切实可行的技术方案。
• Depends on the analysis of characteristics of excimer laser and the projection objective , a high multiple lens is designed , which is optimized by the professional software zemax , and then used in the accurate micro - machining . the system eliminate the lens aberration perfectly , and meet the requirement of machining at the precision of several microns
  分析了目前主要的几种投影物镜系统特点,从光学设计理论出发,由专业光学设计软件zemax优化,设计加工了用于高精度准分子激光微孔加工的倍率为100 : 1的投影成像物镜。