抛光模的英文

• burnishing die
• polished dies
• polishing tool

• "抛光"英文翻译    polishing; burnishing; buffi ...
• "模"英文翻译    mould; pattern; matrix
• "蜡抛光模" 英文翻译 :    wax polisher
• "沥青抛光模" 英文翻译 :    pitch polishing tol
• "沥青抛光模具" 英文翻译 :    pitch polishing
• "光模" 英文翻译 :    opitcal mode; optical mode
• "抛光" 英文翻译 :    [机械工程] polishing; burnishing; buffing; chasing 抛光零件 polish parts; 抛光机 glazing machine; polisher; polishing machine; 抛光剂 brightener; polishing agent (光学零件加工); polishing compound; (brilliant) polish; politure; 抛光轮 buff [polishing] wheel; 抛光装置 buffing attachment
• "擦光模" 英文翻译 :    burnishing die
• "光模式" 英文翻译 :    optical mode
• "光模像" 英文翻译 :    optical model
• "激光模" 英文翻译 :    lasing mode; lasingmode; mode of laser
• "挤光模" 英文翻译 :    burnishing die
• "李光模" 英文翻译 :    kwang-mo lee
• "测光模式" 英文翻译 :    meteringmode
• "灯光模板" 英文翻译 :    light template
• "光模糊的" 英文翻译 :    blear eyed
• "光模拟传输" 英文翻译 :    optical analog transmission
• "光模拟链路" 英文翻译 :    optical analog link
• "光模频率" 英文翻译 :    optical mode frequency; optical-mode fraquency
• "光模消除器" 英文翻译 :    optical mode stri er; optical mode stripper
• "激光模控制" 英文翻译 :    laser-mode control; laser-modecontrol
• "激光模式" 英文翻译 :    laser mode; lasing mode
• "门曝光模式" 英文翻译 :    bulb exposure
• "偏振光模拟" 英文翻译 :    polarized light analogue
• "曝光模式" 英文翻译 :    exposuremode

• The amendment model of the removal function is set up . theoretical basis is given for solving the edge effect problem . [ 3 ]
  推导出了双转子机构抛光模在露边时的去除函数修正模型,为解决加工过程中的边缘效应问题提供了理论基础。
• When the polishing tool moves along the edge of the workpiece , the theoretical removal function model is not suitable for the machining practice ( the edge effect )
  研究了双转子研抛模在加工工件边缘时,因抛光模露边而带来的去除模型变化问题(即边缘效应) 。
• The polishing technology of ccos is studied by a series of experiments . the effect of polishing process parameters on the removal efficiency and the stability of the removal function are studied , which include the polishing compound , the density of the polishing fluid , ph of the polishing fluid , the polishing velocity , the polishing pressure and so on . finally , a suit of effective process parameters are given and better experimental result are obtain
  在大量工艺实验的基础上,揭示了抛光剂种类、抛光液的供给量、抛光液浓度、抛光液的酸度值( ph值) 、抛光速度、抛光压力、抛光模材料、抛光模直径及胶层厚度等对抛光效率和去除函数稳定性的影响规律;最后,总结了一套抛光工艺,利用该工艺进行的抛光精度收敛性实验达到了较好的效果。