散射能量的英文

• scattared energy
• scattaredenergy
• scattered energy

• "散射"英文翻译    scattering; radio scattering ...
• "能量"英文翻译    energy; amount of energy
• "散射能力" 英文翻译 :    scattering power
• "被反射能量" 英文翻译 :    reflected energy
• "发射能量" 英文翻译 :    emitted energy
• "反射能量" 英文翻译 :    reflected energy
• "辐射能量" 英文翻译 :    quantity of radian energy; quantity of radiant energy/quantity of radiation; radiation energy
• "辐射能量流" 英文翻译 :    radiant energy flow
• "幅射能量" 英文翻译 :    quantity of radiation
• "净辐射能量" 英文翻译 :    net radiation
• "入射能量" 英文翻译 :    projectile energy
• "声发射能量" 英文翻译 :    acoustic emission energy
• "透射能量" 英文翻译 :    transmission potential
• "虚反射能量" 英文翻译 :    ghost energy
• "电子散射能力" 英文翻译 :    electron scattering power
• "反散射能谱法" 英文翻译 :    backscattering spectrometry; bs
• "辐射能的散射" 英文翻译 :    scattering of radiant energy
• "绝对散射能力" 英文翻译 :    absolute scattering power
• "离子散射能谱" 英文翻译 :    ion scattering spectroscopy; ion scattering spectrum; iss
• "转换散射能带" 英文翻译 :    umwertungsstreuband conversion scatter band
• "反射波能量 反射能 反射能量" 英文翻译 :    reflectedenergy
• "辐射能量单位" 英文翻译 :    unit of radioactivity
• "辐射能量交换" 英文翻译 :    radiant energy exchange
• "辐射能量密度" 英文翻译 :    radiant energy density; radiant flux density
• "辐射能量视差" 英文翻译 :    radiation energetic parallax

• We can get information of particle size with the measuring jumpiness of light scattering energy
  通过对7角的散射能量跳动量的测量能够得到颗粒大小的信息。
• Then according to the radar equation , on the base of the platform of ray tracing , builds a simulation platform of backscatter ionogram
  然后根据雷达方程计算返回散射能量,在射线轨迹平台的基础上,建立了返回散射电离图仿真平台。
• Abstract : a new method for determining proximity parameters , , and in electron - beam lithography is introduced on the assumption that the point exposure spread function is composed of two gaussians . a single line is used as test pattern to determine proximity effect parameters and the normalization approach is adopted in experimental data transaction in order to eliminate the need of measuring exposure clearing dose of the resist . furthermore , the parameters acquired by this method are successfully used for proximity effect correction in electron - beam lithography on the same experimental conditions
  文摘:在电子散射能量沉积为双高斯分布的前提下,提出了一种提取电子束光刻中电子散射参数,和的新方法.该方法使用单线条作为测试图形.为了避免测定光刻胶的显影阈值,在实验数据处理中使用归一化方法.此外,用此方法提取的电子散射参数被成功地用于相同实验条件下的电子束临近效应校正