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方块电阻的英文

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"方块电阻"怎么读用"方块电阻"造句

英文翻译手机手机版

  • ohms per square
  • sheet resistance

例句与用法

  • The transmittance and reflectance properties of different sheet resistance ito films have been researched in this paper
    研究了不同方块电阻ito膜的透射和反射特性。
  • The result is showed that the value of square resistence is 30 . 2 o in heavily doping area and 100 . 2o in lightly doping area
    实验结果显示,重掺杂区和轻掺杂区的平均方块电阻分别为30 . 2和100 . 2 ,相差70 。
  • A detailed analysis of the electrical properties of ato thin films was carried out in order to investigate the sb / sn atomic ratio and substrate temperature ' s influence on the ato thin film . a convictive explanation brought forward to illustrate the changing of the electrical ; properties of the ato thin film in different conditions
    在温度较低时( < 500 ) ,薄膜的方块电阻随成膜温度的升高而降低;当基板温度继续升高,薄膜的方块电阻随基板温度的升高而增大,这主要是因为玻璃基板中k ~ + 、 na ~ +离子向薄膜中的扩散。
  • Secondly , we measured the electrical properties of the ion - implanted samples by hall method ( square carrier concentration , square resistance and carrier mobility ) . after comparing and analyzing , we can know that the electrical properties were affected by the difference of mn dose , the implantation of c and the annealing temperature
    其次,利用霍尔测试方法测量了每种离子注入样品的电性质(方块载流子浓度、方块电阻及载流子迁移率) ,通过比较分析了解到mn元素注入剂量、 c元素的注入以及退火温度的不同,都会对样品的电性质产生影响。
  • Experimental results revealed that the carrier mobility increased with increasing of the annealing temperature , in the range of the annealing temperature from 650 ? to 850 ? , which implied that the crystal lattice structure was damaged by ion implantation and restored after annealing . furthermore , the square carrier concentration decreased , and the square resistance of the samples implanted by mn + and c increased with the raising of annealing temperature . these results indicated that the second phase such as mnga , mnas ferromagnets was formed by more mn + ions with increasing of the ( gaas ) annealing temperature , so the mn + ions which can provide carriers decreased
    由实验结果可以知道在退火温度为650 850范围内,样品的载流子迁移率随着退火温度的提高呈上升趋势,说明杂质元素的注入对样品造成晶格损伤,但退火对这些损伤具有修复作用;此外,随着退火温度的上升,样品的方块载流子浓度不断下降,加c样品的方块电阻不断上升,这都是因为随着退火温度的提高,掺入的mn ~ +离子不再提供载流子,而是形成了mnga 、 mnas等磁性第二相。
  • The films prepared under 425 ? is composed with amorphous snoi and its sheet resistance is very high . with the substrate temperature ' s increasing , the degree of crystallization , film thickness increase and electrical resistivity , sheet resistance decrease obviously . when the substrate temperature is higher than 525 ? , the temperature ' s increasing is not of benefit to the films thickness and sheet resistance
    常压热分解cvd法制备的sno _ 2在较低基板温度下制备出的薄膜基本上是非晶态的,方块电阻很高;随着基板温度的升高,薄膜厚度增加,薄膜结晶程度提高,薄膜电阻率和方块电阻均显著降低;当基板温度高于525以后,随着基板温度的升高,薄膜厚度基本不再明显增加,薄膜结晶程度继续提高,薄膜电阻率继续降低,方块电阻不再明显降低。
  • The traditional bandgap reference circuit was improved in the design , which includes the applying of self - bias structure and cascode structure , output of the opamp was used as self - bias voltage , saving bias circuit , and then it was helpful to get low power consumption . through using poly resistance of high value with low temperature coefficient , we reduced the influnce to circuit , if power supply did not change , we must decrease operating current to decrease power consumption , and increasing value of resistor could decrease the operating current efficiently . poly resistance of high value had large value of squared resistor , so we could save layout area
    对传统带隙基准电路进行了改进设计,采用自偏置结构和镜像电流镜结构,利用运放的输出电压作为运放的偏置电压,节省了偏置电路,降低了功耗;使用低温度系数的多晶硅高值电阻,降低了电阻温漂对电路的影响;在电源电压不变的情况下,为了减小功耗就必须减小工作电流,而增大电阻的阻值能有效地减小工作电流,多晶硅高值电阻的方块电阻很大,可以节省版图面积。
  • Through study on the electrical performance of sn - in2o3 nano powder , some conclusions were drawn . when sn - in2o3 precursor was calcinated at 700 - 1000 , low square resistance was got . the resistance was lower when sn - in2o3 precursor was calcinated in vacuum than air condition
    Sn - in _ 2o _ 3纳米粉体的电性能研究表明: sn - in _ 2o _ 3前驱物在700 - 1000煅烧,方块电阻较低,真空条件下煅烧试样的电阻比空气条件下煅烧试样的电阻低,南京工业大学硕士学位论文中文摘要sno :掺杂10wt %左右时,试样方块电阻最低。
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