电流密度分布的英文

• current density destribution
• current density distribution

• "电流密度"英文翻译    current density
• "分布"英文翻译    distribute; spread; scatter; ...
• "电流密度分量" 英文翻译 :    current density component
• "水平电流密度分量" 英文翻译 :    horizontal current density component; horizontalcurrentdensitycomponent
• "大电流密度" 英文翻译 :    hcd high current density
• "电流密度" 英文翻译 :    ampere density; cd current density; curl density; c．d．current density; density current; electric current de ity; electric current density
• "高电流密度" 英文翻译 :    hcd
• "面电流密度" 英文翻译 :    surface current density
• "像电流密度" 英文翻译 :    image current density
• "阈电流密度" 英文翻译 :    threshold current density
• "电流密度, 扩散流密度。" 英文翻译 :    current density
• "保护电流密度" 英文翻译 :    protection current density; protective current density
• "饱和电流密度" 英文翻译 :    saturation current density
• "低电流密度法" 英文翻译 :    low-density method
• "电浆电流密度" 英文翻译 :    plasma current density
• "电流密度(安培数)" 英文翻译 :    ampere density
• "电流密度范围" 英文翻译 :    current density range
• "额定电流密度" 英文翻译 :    nominal current density
• "发射电流密度" 英文翻译 :    emission current density
• "放射电流密度" 英文翻译 :    emission current density
• "极限电流密度" 英文翻译 :    limit current density; limiting current density
• "交换电流密度" 英文翻译 :    exchange current density
• "经济电流密度" 英文翻译 :    economic current density
• "均匀电流密度" 英文翻译 :    uniform current density
• "空穴电流密度" 英文翻译 :    hole current density

• Research on the distribution of electric field in electrostatic precipitator
  电除尘器板电流密度分布的试验研究
• The effect of attractive potential on the current distribution is different from that of repulsive one
  发现杂质势为吸引势和排斥势时对电流密度分布的影响是不同的。
• After the distribution of the current density is derived , an anti - plane shear problem is formulated whose solution is obtained in closed form
  首先求出薄板内电流密度分布，然后考虑一类简化的计算模型，把应力求解确定为反平面剪切问题，进而推出应力在板内分布的解析解。
• Finite element method ( fem ) is used to quantificationally simulate the current density distribution of the whole cfrc sample , and to explain the mechanism and reason for precipitations " depositing in the crack tip
  利用有限元定量地模拟了整个试件的电流密度分布状况，阐述了沉积物在裂纹尖端的沉积状况及其原因。
• The obtained results indicate that the concentrations of reactants in the catalyst layers in front of t he current collectors are very low , that reduce the utility of catalyst ; the current density at the edges of the channels is many times greater than the mean current density
  计算了电池内反应物浓度的分布、电流密度分布、甲醇窜流以及电压-电流特性曲线等。结果表明：集流板前的催化层内反应物浓度非常低；流道边缘附近电流密度比平均电流密度大许多倍。
• The electrical simulation compared the temperature and the current density distribution in copper lines with different width and barrier materials , the result indicating that the maximum temperature locates in the middle of the line and the 20 - degree obliquity is the most optimum one in the pore structure
  在电学模拟过程中，对比了不同条宽和不同阻挡层材料下的互连线的温度、电流密度分布，以及不同通孔倾角下、不同阻挡层材料下的通孔的温度、电流密度分布。
• Based on some discussions on the mathematic model set up for the cathodic protection potential field , a two - dimensional boundary element method ( bem ) is developed , and by using which , a study on the shielding effect resulted from some typical inner structures such as the reinforcing elements and the partition walls with man holes on distribution of potential and current density in the cathodic protection is performed . the investigated parameters which affect the shielding effect in the calculating model include : the height and thickness of the reinforcing elements , the distance between the anode and the reinforcing elements , and the diameter of man hole on the partition walls , and so on
  本文在讨论了阴极保护电位场问题的数学模型的基础上，以二维边界元法对阴极保护问题中的电位及电流密度分布进行了模拟计算，重点对船舶压载舱中的典型结构如加强筋、人孔等在阴极保护中所产生的屏蔽效应进行了分析和研究，通过对不同高度、厚度的挡板及不同孔径的带孔板所产生的屏蔽效应进行模拟计算，首次得到了一些对实际工程设计具有重要参考意义的见解。
• The main work can be summed up as follows : firstly , we studied the thermal - field properties of vcsels , and analyzed the influences of current spreading , material parameters and operating conditions on the temperature distributions . secondly , we began with the electrode voltage and calculated the equipotential s distributions , compared the distributions of voltages and current densities in different depths of vcsels , and then studied the influences of the oxide - confining region with different position or thickness , and the different sizes of the gain - guided aperture and emitting window on the distributions of the injected current density , carrier concentration and temperature in the active region . thirdly , we realized the coupling of electricity , optical and thermal - fields , worked out the threshold voltage , calculated the distributions of the injected current density , carrier concentration and temperature under different offset voltages , and analyzed the impacts of temperature profile and carrier density on the refractive index , fermi levels and optical - field
  具体工作可以概括如下：首先，研究了vcsel的热场特性，分析了电流扩展，材料参数和工作条件对于温度分布的影响；其次，从电极电压入手，计算出激光器中的等势线分布，并对不同深度处的电压和电流分布进行比较，研究了高阻区的不同位置和不同厚度、限制层和出射窗口半径的大小对电流密度、载流子浓度和温度分布的影响；再次，实现了电、光、热耦合，求出了阈值电压，计算了不同偏置电压下的电流密度分布、载流子浓度分布和热场分布，分析了温度和载流子浓度变化对折射率、费米能级和光场的影响；最后，给出了考虑n - dbr和双氧化限制层时激光器中的等势线分布，分析了n - dbr和双氧化限制层对vcsel电流密度、载流子浓度、温度和光场分布的影响。