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离子密度的英文

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"离子密度"怎么读用"离子密度"造句

英文翻译手机手机版

  • ion concentration
  • ion density

例句与用法

  • Linear ion density
    线离子密度
  • In this technique , the particle density in the beam is very low ( typically 105 thickness ) , so perturbations from collisions and inter - ionic fields are absent
    而且离子密度低(一般密度为10 ~ 5 cm ~ 3 ) ,因此不会出现自吸收、碰撞退激发以及离子间场效应等现象。
  • Through two - fluid and two - time - scale approximation , the dominating equations , which show the non - linear coupling between high frequency modulational field and the density disturbance of electrons and ions , are obtained
    这组方程描述了高频调制场和电子、离子密度低频扰动之间的非线性耦合。
  • This paper studies the application of inductively coupled plasma ( icp ) technology to the etching compound semiconductor insb - in film . by means of single probe and double probe , the ion density and electron temperature of chamber ( 30mm and 50mm in height respectively ) under varied process condition were diagnosed . the spatial distribution of the axial position of the two parameters and the varied curve that the two parameters varies with the power and air pressure are obtained
    利用单探针和双探针诊断30mm高反应室和50mm高反应室在各种工艺条件下的离子密度和电子温度,得到这两个参数在反应室轴向位置的空间分布、随功率和气压的变化曲线、顶盖接地和反应室体积对它们的影响,结果表明离子密度为10 ~ 8 10 ~ ( 10 ) cm ~ ( - 3 ) ,电子温度在4 10ev之间;当顶盖接地时,该处的等离子体密度明显大于不接地;在同样条件下, 50mm高反应室内的离子密度明显大于30mm高反应室。
  • This paper mainly study on the technics of preparing nano - si3n4 and icpecvd . seeking for the proper parameter and technics , crystallization of nano - si3n4 powder with muffle furnace , probe the new effective way of improving the properties of nano - si3n4 powder the ion density in the reaction chamber was diagnosed by a langmuir probe . the rules were obtained under different air pressure , different radio frequency power and different position which the ion density changes about from 1010cm - 3 to 1010cm - 3 decreasing as the pressure increases and increasing as the power decreases
    利用朗缪尔探针诊断了反应室内等离子体参数,得到不同位置、不同功率和不同气压下等离子体密度的变化规律,结果表明离子密度为10 ~ 8 10 ~ ( 10 ) cm ~ ( - 3 ) ,等离子体密度随着功率的增大而增大,随着气压的升高而减小,由于离子鞘层的存在,在一定条件下提供了局部等离子体密度稳定的区域。
  • In this paper , we focus on the following three topics : ( i ) density distribution of dusty plasma in the low - pressure collisionless positive column the radial density distributions of electron , ion and dust particle in the low - pressure collisionless positive column are investigated with a fluid theory and a self - consistent dust - charging model
    本文着重以下三个方面的研究: ( )低气压无碰撞辉光放电正柱区尘埃等离子体密度径向分布本文采用流体模型和自洽的尘埃充电模型,研究了低气压无碰撞辉光放电正柱区的电子密度、离子密度和尘埃粒子密度的径向分布。
  • Numerical simulation results indicate that , for low temperature dust particles , dust particles mainly exist in the area near the column center and their charge - number can be considered as a constant , while in the area where there are no dust particles , ion and electrons are in ambipolar diffusion ; for high temperature dust particles , both the distribution regions of dust particle and high ion density are expanded and dust charge - number is increasing with the distance from the center
    计算结果表明:当尘埃粒子的温度较低时,尘埃粒子主要集中在圆柱形放电器的中心很小的区域,尘埃粒子携带的电荷几乎是一个常数,受尘埃粒子空间电荷的影响,离子在该区域的密度最高。在远离中心区域,离子和电子呈现双及扩散特点;当尘埃粒子的温度较高时,尘埃粒子分布的区域和高离子密度区域扩大,尘埃粒子离放电器中心越远,携带的负电荷越多。
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