等离子体光源的英文

• plasma ion source
• plasma light source
• plasma source

• "等离子体"英文翻译    plasma; plasma body
• "光源"英文翻译    light source; source; illumi ...
• "等离子体光量计" 英文翻译 :    plasma quantometer
• "电感耦合等离子体光谱仪" 英文翻译 :    inductively-coupled plasma ectrometer; inductively-coupled plasma spectrometer
• "感应耦合等离子体光量计" 英文翻译 :    inductively coupled plasma quantometer
• "激发等离子体光谱仪" 英文翻译 :    emission plasma spectrometer
• "微波等离子体光谱仪" 英文翻译 :    microwave inductive plasma emission spectrometer mip; microwave inductive plasma emission spectrometer(mip)
• "靶等离子体" 英文翻译 :    target plasma
• "钡等离子体" 英文翻译 :    barium plasma
• "超等离子体" 英文翻译 :    epiplasma
• "磁等离子体" 英文翻译 :    magnetic plasma; magnetoplasma
• "等离子体" 英文翻译 :    plasma; plasma body (一般指电离的气体, 由离子、电子及未经电离的中性粒子所组成, 如火焰和电弧中的高温部分, 太阳和其它恒星的表面气层等)
• "等离子体波" 英文翻译 :    plasma waves
• "等离子体层" 英文翻译 :    plasmasphere
• "等离子体刀" 英文翻译 :    plasma scalpel
• "等离子体管" 英文翻译 :    plasma tube; plasmatron
• "等离子体弧" 英文翻译 :    plasma arc
• "等离子体环" 英文翻译 :    plasma torus
• "等离子体怜" 英文翻译 :    plasma flow
• "等离子体流" 英文翻译 :    plasma flow; plasma jet; plasma stream
• "等离子体炉" 英文翻译 :    plasma furnace; plasmafurnace
• "等离子体片" 英文翻译 :    plasma sheet; plasmasheet
• "等离子体器" 英文翻译 :    plasmatron
• "等离子体枪" 英文翻译 :    plasma gun; plasma jet
• "等离子体区" 英文翻译 :    plasma slab

• Secondly , investigation on several key parameters like laser wavelength , pulse duration and power density have been carried out for the purpose of optimizing radiation from various liquid aerosol spray targets
  根据理论计算结果，对液体微滴喷射靶激光等离子体光源的工作物质、激光打靶条件、光源结构参数进行了优化。
• The work was held out by the fund of nature science , 863 fund and innovation fund of chinese academy of sciences . in this work , we firstly got the relative spectrum distribution of lpp source with jet gas target in domestic lpp source study
  该项工作是在国家基金、 863 、中科院创新基金支持下完成的，首次在国内获得喷气靶激光等离子体光源的相对光谱分布，为进一步进行高精度测量工作奠定了基础。
• Extreme ultraviolet lithography is being developed as one of the most important candidates to fabricate a sub - o . lum - pattern . in recent years , several key technologies have been developed rapidly such as laser producing plasma source , extreme ultraviolet multilayer , optical fabrication and metrology , projection - camara alignment , low - defect mask and control technology of stage
  极紫外投影光刻( extremeultravioletlithography简称euvl )最有可能成为下一世纪生产线宽小于0 . 1 m集成电路的技术，近年来在激光等离子体光源、极紫外多层膜、光学加工和检测、光学精密装调、低缺陷掩模、光刻胶技术以及高稳定工作台系统控制等关键技术方面得到了飞速发展。
• This article studies on a novel method about detector calibration and monochromator calibration by using silicon pin photodiode . the detector and the monochromator of one spectrum measurement system had been calibrated using the method , and the spectrum distribution of one laser - produced plasmas ( lpp ) source with jet gas target was measured . the use of a specific combination of the silicon photodiode and multiplayer reflect films is the notable character in monochromator calibration
  本文研究了一种利用光电二极管传递标准探测器标定普通探测器和单色仪系统的方法，实际标定了所用的探测器和单色仪系统，测得了喷气靶激光等离子体光源的相对光谱分布，设计出绝对光谱分布的测量方法，并且利用labview的g语言及相应的数据采集卡等硬件设备构造出一套智能化、高效率的测量系统，完成了多层膜反射率测量工作。