micrograph中文是什么意思

发音:

中文翻译
造句

n.
微写器；【物理学】微动扩大测定器；显微(镜)制图[照相、照片]。

electro micrograph 电子显微镜相片
electron micrograph 电镜照片; 电子微动描记器; 电子微写器; 电子显微镜检查，电子显微照片; 电子显微镜相片; 电子显微镜照片; 电子显微镜照相; 电子显微图; 电子显微照相
electronic micrograph 电子微为器; 电子显微相片
emission micrograph 发射式电子显微镜照片
micrograph test 微观组织试验
photomicrograph; micrograph 显微照片
scanning micrograph 扫描显微图象; 扫描显微照片
sem micrograph 扫描电子显微镜照相术
tem micrograph 透射电子显微镜显微照片
bright field micrograph 明场显微照片
color photo micrograph 彩色显微像片
dark field micrograph 暗视场显微照片
electron probe micrograph 电子探针显微照片
electron scanning micrograph 电子扫描显微镜照片; 电子扫描显微照片; 扫描电子显微照片
field emission micrograph 场致发射显微镜照片
field ion micrograph 场致离子显微照片
sca ing electron micrograph 扫描电子放大器
scanning electron micrograph 【物理学】扫描电子显微照相。
microgranular texture 微粒结构
micrographia 显微镜检查术; 写字过小症
microgranular 微晶粒状的; 微粒状的
micrographic 微文像状; 微文象状的; 显微的显微摄影业低倍照相的微文象状; 显微照相的
microgranodiorite 微花岗闪长岩
micrographic intergrowth 微文像共生
microgranitoid 微花岗状的; 微准花岗状
micrographic system 图像缩影系统

"查查词典"手机版

千万人都在用的超大词汇词典翻译APP

例句与用法

In considering diffraction errors there are two factors which will lead to diffracted rays originating from outside the area defined by the selector aperture , these are important in any work where a spatially accurate correlation of the diffraction data and the micrograph is required
考虑到衍射的差错，有两个因素决定源自选择孔指定区域外部的衍射线，在任何工作中这些都是重要的，当衍射数据和显微图之间准确的空间对射被要求时。
Whether the 180 inversion appears in the relation between the electron - optical image , i . e . the micrograph , and diffraction pattern seen on the final screen , depends on the number of inversions that the image and diffraction pattern undergo by the lenses following the objective lens in the microscope column
电子光学映像比如显微图和最终屏幕所见衍射模型之间180度倒置的出现是否有联系，取决于显微镜柱中目标通过透镜产生的映像的倒置数量。
Xrd , transmission electron micrograph ( tem ) and polarized optical micrograph ( pom ) were used to measure the structure of nanocomposites , the nonisothermal crystallization kinetics of pp / pp - g - mah / org - mmt was studied by differential scanning calorimetry ( dsc ) , and their mechanical properties were tested
采用熔融插层法制备了聚丙烯接枝物蒙脱土纳米复合材料，通过xrd 、 tem 、 pom和dsc研究了纳米复合材料的结构及结晶动力学，并测试其力学性能。
2 structure measurement of multi - wall carbon nanotubes after ball milling . the long cnts has been shorted by commen ball milling and effect of time on cnts has researched . the mechanism of cut has been analyzed . 3 the research of adsorption of mnoa by cnts , the tem micrograph of cnts and mechanism were analyzed
2多壁碳纳米管球磨后的结构表征，采用低速球磨机，使碳纳米管变短，澎器掀蕊研究了球磨时间对碳纳米管的影响，对其断裂机制作了定性分析。
Finally build the foundation to prepare the composites of structure and m - type ferrite with structure and function properties . the constituent phases , microstructure and crystal dimension and crystal coalescence , mechanical properties , magnetic properties of the composites were investigated by means of x - ray diffraction ( xrd ) , scanning electron micrograp h ( sem ) and transmission electron micrograph ( tem ) , mechanical testing instrument , vibrating sample magnetometer ( vsm ) respectively
采用xrd技术鉴定复合材料的物相，利用sem ， tem来分析srfe12o19及其复合材料的结构形貌，颗粒大小及结合情况，使用伺服材料实验机、洛氏硬度计及振动样品磁强计( vsm )测试了复合陶瓷的抗弯强度、硬度及其磁性能，并探讨它们之间关系。
Nanocrystalline cerium ( iv ) oxide ( ceo2 ) powders were prepared by means of different methods , sol - gel method , precipitation method and electrochemical method . the powders were analyzed by using x - ray diffraction ( xrd ) and transmission electron micrograph ( tem ) . ceo2 powders in different ways were compared from shape of particles and preparation technics
本文主要采用液相法中的溶胶-凝胶法、均匀沉淀法和电化学法制备了ceo _ 2纳米粉体，通过x -衍射、透射电子显微镜等手段对所制备的纳米粒子进行了表征，并从粒子的形态及制备工艺上进行了比较。
By analyzing the microstructure of as - cast alloys with different surplus of samarium added , the optimum surplus of samarium is decided . by comparing the microstructure of the alloys annealed for different time , the ideal and economical annealing time is confirmed . the microstructure and phase composition of alloys during the whole preparation of sm2fe17nx are analyzed using the scanning electron micrograph with energy - dispersive x - ray analysis and x - ray diffraction patterns
本论文首先就熔炼工艺参数对铸态组织微结构的影响进行了探讨，并制定出一套较为合适的熔炼工艺；通过对不同钐加入量的铸态组织微观结构的观察分析，确定了原料配置过程中钐的最佳补偿量；通过对采用不同退火时间的合金组织进行比较，确定了理想、经济的退火时间；同时还利用扫描电子显微图像和x射线衍射图谱，比较了整个制备过程中，试样微结构和相组成的变化情况。
The chemical composition and microstructures of the insulating thin films prepared by different methods were analyzed by x - ray diffraction ( xrd ) and scanning electron micrograph ( sem ) ; other properties such as electric resistance , the breakdown field strength and dielectric properties were evaluated using high resistance meter , voltage resistance meter and precision impedance analyzer respectively
采用x射线衍射仪( xrd )对表面绝缘薄膜的物相组成进行了分析,扫描电子显微镜( sem )对表面绝缘薄膜的微观结构进行了研究,并用绝缘电阻测试仪、耐压测试仪和精密阻抗分析仪分别对绝缘膜进行绝缘电阻率、击穿场强和介电性能的测试。
For xrd , ellipsometry examinations , single - side - polished si ( lll ) wafers were used as substrates and for resistance measurement , glass was used and for infrared examination , double - side - polished si ( lll ) wafers were used and for ultraviolet - visible spectrophotometry , double - side - polished quartz wafers were used and for tem micrograph and electron diffraction pattern observation , cu nets deposited by formvar film were used . the cu - mgf2 cermet films were from 50 to 600nm thick
用于xrd分析、椭偏测量的单抛si ( 111 )晶片和电阻测试的载玻片上淀积膜厚约为600nm ；用于ir测试的双抛si ( 111 )晶片和uv测试的石英玻璃片上淀积膜厚约为250nm ；用于透射电镜分析的样品则淀积在400目铜网上的支撑formvar膜上，膜厚约为50 100nm 。
Graphite particle surfaces are coated by a layer of oxides equably through micrograph images . in addition , the coating effect of al2o3 - coated particle is the best and much homogeneously ; the effect of tio2 - coated particle is the worst and its self - nucleation was serious , while after al2o3 / zro2 - coated , the coating on graphite surface becomes much denser
通过形貌观察，表面均包覆上相应的氧化物，其中，以al _ 2o _ 3的包覆情况最好，包覆较均匀；以tio _ 2的包覆情况最差，自身形核最严重，经过双层复合包覆后石墨颗粒表面的包覆层更加致密。