物理化学过程的英文

• physical chemical process
• physicochemical process
• physiochemical process

• 物理化学    physical chemistry
• 过程    process; procedure; transver ...
• 物理化学单元过程    physicochemical unit process
• 冶金过程物理化学    physical chemistry of process metallurgy
• 电化学过程    electric chemical process; electrochemical process
• 光化学过程    photochemical process
• 化学过程    chemical performance; chemically process; chemistry; physico-chemical proce es; physico-chemical processes
• 物理化学    chemicophysics; phys chem; physical and chemical sciences; physical chemistry; physico chemistry
• 物理化学的    physico chemical; physicochemical; physiochemical
• 物理化学法    physical-chemical process
• 物理化学家    physical chemist
• 地球化学过程    geochemical process
• 地质化学过程    geochemical process
• 放射化学过程    radiation chemical process
• 辐射化学过程    radiation chemical process; radiationchemicalproce
• 化学过程分析    chemical process analysis
• 化学过程减弱    chemasthenia
• 化学过程实验    experiment of chemical engineering
• 生物化学过程    biochemical proce es; biochemical processes
• 物理化学（含化学物理）    physical chemistry (including chemical physics)
• 海洋物理化学    marine physical chemistry
• 基础物理化学    basic physical chemistry
• 染色物理化学    physical chemistry of dyeing
• 生物物理化学    biophysical chemistry; physico-chemical biology the; physico-chemical biology, the

• Studies on mechanism of the laser processing the diamond were carried out
  激光与金刚石相互作用的物理化学过程的机理研究。
• The air flow across the plasma generator will result in heat transfer , mass transfer , plasma chemical reactions and other mechanisms of processes
  空气流经等离子发生器时会发生传热、传质以及等离子化学反应等一系列复杂的物理化学过程。
• The effects of pulse voltage waveform on physical and chemical water treatment processes include double layer capacitor effect , mass transport , absorption and deabsorption on the surface of electrode
  脉冲电压波形主要影响废水处理的三个物理化学过程，即：电容效应、液相传质、吸附和脱吸附。
• Although the products have same chemical compositions , they will exhibit various isotopic ratios if they produced from different sources or by different chemical / physical processes
  虽然物质具相同之化学组成，但如果来源不同或经不同物理化学过程所产生，其同位素比值会因同位素的分化作用而有差异。
• The main errand of nonferrous metallurgy enterprise , which has continuous processing and belong to flow enterprise , is refine nonferrous through complex physical and chemical process
  有色冶炼企业属于具有连续生产过程的流程型行业，其主要任务是将原料中的有色金属通过复杂的物理化学过程提炼出来。
• In production process of waterworks , the quantity of medicament is of most importance because it related to the quality of production water , meanwhile it is also difficult to deal with
  在水处理单元环节的自动控制方面，混凝投药是重要的环节，因为这一环节关系到出厂水的水质；同时它又是最困难的环节，因为它涉及的是一个复杂的物理化学过程。
• The physical and chemical processes of nozzle atomization and the evaporation , mixing and combustion of propellant drop flow are very complex . for the reason , the researches on nozzle are still based on the experimental research now in or abroad
  由于喷嘴雾化及其喷雾流的蒸发、混和和燃烧是一个非常复杂的物理化学过程，目前国内外对喷嘴的研究仍以模型实验研究为主。
• Radioactive sources are studied in the thesis . such physical and chemical phenomena as radionuclides " generation , release and transference are discussed . in order to adapt them to real time simulation , radionuclides are dealt with briefly
  本文分析辐射源项，讨论了涉及放射性核素产生、释放、传递等物理化学过程，并对放射性核素进行了简化处理，以使其适应实时仿真的需要。
• Special attention is paid to the consequences of methanol crossover in cathode reaction and cathode over - potential . good agreement is found between simulations and experiments in regard to the v - i character of dmfcs . based on the theory of parallel electrode reaction , it becomes possible to obtain quantitatively the value of over - potential caused by methanol crossover , which is either implicit or not included in the overall cathode over - potential in previous models
  该模型涵盖了dmfc中的主要物理化学过程，包括：甲醇水溶液在膜电极内的扩散、对流和电迁移；质子在阳极催化剂层和阴极催化剂层内的传递；氧气、水蒸汽在阴极的扩散；阳极催化剂层内的甲醇氧化反应动力学；以及阴极催化剂层内的氧还原和甲醇氧化反应动力学。
• In this paper , the growth technology is presented for epitaxial silicon carbide films on sapphire with a buffer layer by atmospheric - pressure chemical vapor deposition ( apcvd ) process . the effect of temperature and precursors flow rates on the growth of silicon carbide films by chemical vapor deposition is analyzed . the structural properties of the films grown on sapphire compound substrate are studied by x - ray diffraction ( xrd ) , x - ray photospectroscopy ( xps ) and photoluminescence spectroscopy
  本论文提出了在蓝宝石上引入一层缓冲层材料形成复合衬底，采用常压化学气相淀积( apcvd )方法在其上异质外延生长sic薄膜的技术，分析了cvd法生长sic的物理化学过程，通过实验提出sic薄膜生长的工艺条件，并通过x射线衍射( xrd ) 、 x射线光电子能谱( xps ) 、光致发光谱( pl谱)和扫描电镜( sem )对外延薄膜的结构性质进行分析。