共溅射的英文

• co-sputtering

• "共"英文翻译    common; joint; mutual; gener ...
• "溅射"英文翻译    sputtering; spurting; disint ...
• "溅射" 英文翻译 :    [半] sputtering; spurting; disintegration; spotter
• "溅射靶" 英文翻译 :    sputtering target
• "溅射泵" 英文翻译 :    sputter pump
• "溅射法" 英文翻译 :    sputter method
• "溅射率" 英文翻译 :    sputtering rate
• "溅射室" 英文翻译 :    sputtering chamber
• "溅射源" 英文翻译 :    sputtering source
• "冷溅射" 英文翻译 :    cool sputtering
• "薄膜溅射" 英文翻译 :    thin film sputtering
• "背面溅射" 英文翻译 :    back spatter
• "长抛溅射法" 英文翻译 :    long throw sputtering method
• "磁控管溅射" 英文翻译 :    magnetron sputtering
• "磁控溅射" 英文翻译 :    magnetron sputtering; megnetron sputtering
• "等离子溅射" 英文翻译 :    plasma spraying; plasma sputtering
• "电化学溅射" 英文翻译 :    electrochemical supttering
• "对射频溅射" 英文翻译 :    rf double sputtering
• "二极管溅射" 英文翻译 :    diode sputtering
• "二极溅射" 英文翻译 :    diode sputtering
• "反应溅射" 英文翻译 :    reactive sputtering
• "反应溅射法" 英文翻译 :    reactive sputtering
• "反应溅射源" 英文翻译 :    reactive sputtering source
• "干-湿溅射区" 英文翻译 :    dry and wet splash zone
• "和溅射效果" 英文翻译 :    spatter

• In this study we focused on the pinning structure , and prepared [ pt / mn ] n multilayer by dc magnetron sputtering system instead of using co - sputtering , by which we wish to find a way to reduce the critical annealing temperature and shorten the annealing time
  在我们的课题研究中，我们着重对钉扎层进行了研究，工艺上采用了pt / mn多层膜而不是传统的共溅射的方法。我们希望通过这种方式能够发现一条降低临界退火温度的途径，并且能够缩短退火时间。
• The influence of depositing condition on the depositing rate and the structure of the films were studied by the aid of tem and xrd . when the temperature ( ts < 450 , ta < 800 ) is low , the structure of the samples is still amorphous . the majority content of the sample is sio 90 by the aid of xps
  利用双离子束溅射沉积技术，通过共溅射方法制备了si - sio _ 2薄膜，研究了沉积时间、工作气压p _ ( ar ) 、基片温度等对沉积速率的影响，用tem和xrd分析了样品的结构。
• In this paper , we reported the structural and luminescent properties of si - based oxide films containing semiconductor si , ge or metal al powders prepared by a dual - ion - beam co - sputtering method ( si - sio2 films and al - si - sio2 films ) or rf magnetron sputtering technique ( ge - sio2 films ) , and analyze the pl and el mechanism . 1 . the composite films of si - sio2 films were prepared by dual ion beam co - sputtering method from a composite target in argon atmosphere
  我们利用双离子束共溅射和射频磁控共溅射技术制备了一系列含有半导体si 、 ge颗粒及金属颗粒al的薄膜，即si - sio _ 2薄膜、 ge - sio _ 2薄膜和al - si - sio _ 2薄膜，分别对它们的结构、光吸收以及发光性质进行了研究。