溅射沉积的英文

• aln

• "溅射"英文翻译    sputtering; spurting; disint ...
• "沉积"英文翻译    deposit; sedimentation; depo ...
• "放射沉积" 英文翻译 :    deposit, radioactive; radioactive deposit
• "溅射" 英文翻译 :    [半] sputtering; spurting; disintegration; spotter
• "共溅射" 英文翻译 :    co-sputtering
• "溅射靶" 英文翻译 :    sputtering target
• "溅射泵" 英文翻译 :    sputter pump
• "溅射法" 英文翻译 :    sputter method
• "溅射率" 英文翻译 :    sputtering rate
• "溅射室" 英文翻译 :    sputtering chamber
• "溅射源" 英文翻译 :    sputtering source
• "冷溅射" 英文翻译 :    cool sputtering
• "沉积" 英文翻译 :    [地] deposit; sedimentation; deposition; precipitation 陆相沉积 continental deposit; 海相沉积 marine deposit; 河口沉积了淤泥。 the river deposited silt at its mouth. 尼罗河泛滥时, 在田野上沉积下一层泥。 when the nile is in flood, it deposits a layer of mud on the fields
• "薄膜溅射" 英文翻译 :    thin film sputtering
• "背面溅射" 英文翻译 :    back spatter
• "长抛溅射法" 英文翻译 :    long throw sputtering method
• "磁控管溅射" 英文翻译 :    magnetron sputtering
• "磁控溅射" 英文翻译 :    magnetron sputtering; megnetron sputtering
• "等离子溅射" 英文翻译 :    plasma spraying; plasma sputtering
• "电化学溅射" 英文翻译 :    electrochemical supttering
• "对射频溅射" 英文翻译 :    rf double sputtering
• "二极管溅射" 英文翻译 :    diode sputtering
• "二极溅射" 英文翻译 :    diode sputtering
• "反应溅射" 英文翻译 :    reactive sputtering
• "反应溅射法" 英文翻译 :    reactive sputtering

• Hysteresis in aluminum oxides films growth with pulsed reactive sputtering
  铝靶脉冲反应溅射沉积氧化铝薄膜中的迟滞回线的研究
• By means of x - ray diffractometry , it is found the fluorocarbon films are amorphous
  X - ray衍射仪对溅射沉积膜的结构进行了研究结果表明cf膜是无定型的。
• Crystal structure and metal - insulator transition properties of dc magnetron sputtered la0 . 825sr0 . 175mno3 films
  直流磁控溅射沉积锰酸锶镧薄膜的结构与相变特性研究
• Helium - charged al films are prepared by direct current ( dc ) magnetron sputtering with a he / ar mixture
  摘要采用氦氩混合气氛下直流磁控溅射沉积方法制备含有氦原子的金属铝膜。
• The bilayer manganite film la2 - 2xsr1 + 2xmn207 ( x = 0 . 32 ) were successfully prepared by pulsed laser deposition ( pld ) method
  我们采用脉冲激光溅射沉积( pld )方法来制备双层薄膜。
• This thesis detailedly discussed die preparation of zrn films with microware - ecr plasma enhanced magnetron sputtering deposition ( mw - ecrpemsd ) technology
  本文探讨了制备zrn薄膜的微波- ecr等离子体增强非平衡磁控溅射沉积工艺。
• Sic films are synthesized using two technologies of pulse laser deposition ( pld ) and chemical vapor deposition ( cvd ) and the characteristics of sic films are analysized in this paper
  本工作采用激光溅射沉积( pld )和激光辅助热丝化学气相沉积( hfcvd )两种实验技术制备了sic薄膜，并对薄膜特性进行了研究。
• The molecular structure of the sputtered titanium oxide films were investigated by xps and x - ray diffraction . it was found that the ratio of ti / o increases when pressure increases , and there is a optimum ratio of ar / o2 for the sake of obtaining more tio2 on pet surface
  利用x射线衍射法( x - ray )对溅射沉积膜的表面物相结构进行了研究，发现在本实验室条件下溅射生成的膜均是无定型结构。
• Three kinds of different methods , namely anode oxidation , micro - arc oxidation and dc reactive magnetron sputtering , were employed to treat aluminum substrate which is used for power electronic devices in order to get an insulating surface by form a layer of aluminum nitride ( aln ) or aluminum oxide ( al2o3 ) film
  本文分别采用阳极氧化法、微弧氧化法和磁控反应溅射沉积氮化铝薄膜的方法对功率电子器件用金属铝基板表面进行绝缘化处理。
• We prepare the si - sio2 and ge - sio2 thin film by using the dual ion beam co - sputtering method and the rf co - sputtering technique respectively , adjusting the substrate temperature ( ts ) and the annealing temperature ( ta ) . then we analysis the structure of the thin film by using the xrd and tem
  论文采用双离子束溅射和射频磁控溅射沉积技术，通过改变薄膜沉积过程中基片温度( t _ s )以及薄膜制备完成后退火温度( t _ a )分别制备了si - sio _ 2和ge - sio _ 2薄膜。